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coating(CVD SIC) - List of Manufacturers, Suppliers, Companies and Products

Last Updated: Aggregation Period:Sep 10, 2025~Oct 07, 2025
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coating Product List

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Thin Film Coating Service

New properties for materials! Contract surface treatment processing that meets the needs for forming with various materials.

Toho Kaken Co., Ltd. has been providing contract processing for various surface treatments using ion plating, vacuum deposition, sputtering, and P-CVD for many years. We can accommodate a wide range of projects, from prototype development to medium and small lot production. We respond to the needs for thin film formation using various materials such as single metals, oxides, nitrides, and carbides. 【Service Features】 ■ Support for prototypes and small lots ■ Compatibility with various materials ■ Use of equipment tailored to specifications, materials, and processes ■ Consideration for the environment For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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Contract processing service for functional thin films

Flexible response and 30 years of experience! A high-performance contract processing service that meets a wide range of requests.

Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance through ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on 35 years of experience, we provide flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us. For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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CVD Coating (QLIMAQ C Series)

We contribute to the improvement of the lifespan of press molds.

The ceramic film produced by our thermal CVD method, which is the beginning of our coating technology, has excellent adhesion strength and has contributed to the improvement of the lifespan of various press molds, including cold forging molds. While coatings such as PVD are currently thriving, our stable performance continues to be highly regarded even today.

  • Surface treatment contract service

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Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Over 30 years dedicated to contract thin film processing! Processing achievements cultivated through rich experience and reliable technology.

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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Conductive Diamond Coating [*Video Available*]

Would you like to try depositing diamonds? We support everything from prototyping to mass production! We have also started selling standard conductive diamond electrodes.

Diamond is an insulator, but it can acquire conductivity by doping with boron. We will uniformly deposit conductive diamond over a large area while maintaining the chemical stability and strength of diamond. Diamond electrodes have a wide potential window, allowing for the decomposition and synthesis of difficult-to-decompose substances through oxidation and reduction reactions. By electrolyzing tap water with diamond electrodes, it is possible to directly produce high-concentration ozone water. Additionally, our unique pre-treatment for film formation improves the adhesion of the diamond film. *For more details, please contact us or download and view the catalog.

  • Other semiconductors

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Vacuum deposition method

We can handle over 50 types of thin film coatings, even from just one piece! Leave thin film formation to us!

A thin film, referred to as "hakumaku" or "usumaku," generally refers to a coating (film) with a thickness at the nano level. Thin films are formed by evaporating or sputtering the material (such as metal) that is to be made into a film within a vacuum apparatus. **"Vacuum Deposition Method"** The vacuum deposition method is a technique where the material (such as metal) intended for the film is heated and evaporated in a vacuum, allowing the vapor (particles) to reach the target object and accumulate to form a film. The vacuum deposition method is characterized by the fact that the vaporized material reaches the target object directly, resulting in minimal damage to the object and the formation of a highly pure film. Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance using ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on our 35 years of experience, we offer flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us.

  • Sensors

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CVD three-layer coating

This is a widely used coating with a proven track record for pull-out dies and plugs!

At Towa Denko Co., Ltd., we handle "CVD three-layer coating," which allows us to obtain materials in various forms such as thin films, fine particles, bulk, and composites. The substances that can be synthesized are diverse, including ceramics, metals, semiconductors, and organic polymers, and it is applied in a wide range of fields from submicron fine processing represented by ultra-LSI to coating of piping materials with meter-scale membranes. 【Features】 - By stacking three layers of TiC, TiCN, and TiN on a substrate of cemented carbide to a total thickness of 5 to 6 μm, it is expected to prevent initial seizure and extend the mold life. - Wear resistance and anti-seizure properties are significantly improved. *For more details, please download the PDF or feel free to contact us.

  • Surface treatment contract service
  • Coating Agent

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High-temperature graphite protective coating

Coating that protects graphite in high-temperature corrosive atmospheres. Effective for MOCVD of SiC and GaN.

This is a product coated with PBN (pyrolytic boron nitride), PG (pyrolytic graphite), TaC (tantalum carbide), and other materials on graphite components. It can accommodate various products and shapes such as wafer trays, heaters, gears, tubes, and crucibles. 【Features】 1) Protects graphite in corrosive atmospheres at high temperatures, such as NH3 and H2. 2) Available in both electrically insulating and conductive coatings. 3) Protects components for high-temperature MOCVD applications. 4) Has excellent coating properties. *For more details, please refer to the catalog or feel free to contact us.

  • Surface treatment contract service

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CVD (Chemical Vapor Deposition) coating refers to.

Functional ceramic films of various types are coated in single or multiple layers using the thermal chemical vapor deposition method, enhancing the performance of the material with the resulting high hardness and high adhesion ceramic films.

CVD coating refers to Chemical Vapor Deposition coating, which is a chemical film formation method. In a state of atmospheric pressure to medium vacuum (100 to 10^-1 Pa), gaseous raw materials are introduced, and energy such as heat, plasma, or light is applied to excite and promote chemical reactions to synthesize thin films or fine particles. These are then adsorbed and deposited on the surface of a substrate, chemically coating it with ultra-hard ceramic compounds. By using thermal chemical vapor deposition, various functional ceramic films are coated in single or multiple layers at high temperatures (900 to 1100°C), significantly enhancing the performance of the material with the resulting high hardness and high adhesion ceramic films. Functions of CVD coating include: slip resistance, chemical resistance, heat resistance, water and oil repellency, hydrophilicity, wear resistance, electrical properties, and dimensional stability.

  • Plasma surface treatment equipment

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Low friction, wear resistance, improved durability" DLC "Hi-Coat δ

We can create high-performance coatings on molds, cutting tools, machine parts, and engine components, resulting in long-lasting, high-value-added products.

Our standard DLC "Hi-coatδ" is a film that has high adhesion and is difficult to peel off. It improves low friction, wear resistance, and corrosion resistance. 【Features】 - Capable of mass production with large machinery. - Provides optimal films according to application. - Develops and supplies high-performance films for motorsports and other applications. - Equipped with various measuring devices for practical property verification. - Quality assurance system based on ISO9001. For more details, please download the PDF or feel free to contact us.

  • Surface treatment contract service

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Multi-functional Sputtering Device 【MiniLab-S060】

A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.

4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (Pulse DC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch MFC x 3 systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Plasma etching can be installed in either the main chamber or the load lock chamber. ● Mixed specifications such as resistance heating deposition, organic material deposition, EB deposition, and PECVD can also be configured.

  • Sputtering Equipment
  • Evaporation Equipment
  • CVD Equipment

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CVD coating

CVD (three layers) and TiC treatment available at all times (upon consultation)! The effective dimensions for coating treatment are φ490×800 mm inside.

The term "CVD method" is an abbreviation for Chemical Vapor Deposition, which refers to chemical vapor deposition. This technology involves heating a mixed gas to approximately 1000°C and causing a chemical reaction on the surface of the substrate to deposit materials such as titanium carbide (TiC), titanium carbonitride (TiCN), and titanium nitride (TiN). Even outside the scheduled dates, we have established a system for implementing CVD (three-layer)/TiC treatment, so we look forward to your inquiries. 【Inspection Equipment (Partial)】 ■ Micro Vickers hardness tester ■ Shore hardness tester, Rockwell hardness tester ■ Inverted metallurgical microscope ■ Desktop microscope + energy-dispersive X-ray analyzer ■ Microscope *For more details, please refer to the related links or feel free to contact us.

  • Processing Contract

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